VOS200-HMDS
High Vacuum Drying Oven
For HMDS / Semiconductor Electronics
LAB1ST VOS200-HMDS is a specialized vacuum drying oven designed for HMDS (Hexamethyldisilazane) pretreatment in semiconductor wafer processing.
It automates key steps such as vacuum pumping, nitrogen purging, and vacuum holding, ensuring precise and repeatable HMDS coating processes for photolithography applications.
Features
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Semiconductor-Specific HMDS Process Automation with vacuum capability up to 100 Pa
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Programmable Control System for precise management of heating, vacuum, nitrogen purge, and timing parameters
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316 Stainless Steel Chamber offering superior corrosion resistance and durability
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Chamber Heating System with no internal electronic components, ensuring contamination-free operation
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Double-Layer Tempered Glass Door for clear visibility of the workspace
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Adjustable Silicone Rubber Seal ensuring high vacuum integrity
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Standard Over-Temperature Protection for enhanced operational safety
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Standard Digital Vacuum Display for precise real-time monitoring
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Low-Noise Professional Vacuum Pump delivering stable and reliable vacuum control
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RS485 Communication Interface for remote monitoring and control
Specifications
Model | VOS200-60L-HV | VOS200-90L-HV |
|---|---|---|
Environment Temp. | 5 °C ~ 40 °C | |
Display Resolution | 0.1°C | |
Temp. Fluctuation | ±1 °C | |
Ultimate Vacuum | 1.0×10⁻4 Pa | |
Vacuum Display | Electronic type | |
Chamber Material | 316 Stainless Steel | |
Chamber Volume | 64 L | 2.26 cu ft | 91 L | 3.21 cu ft |
Shelves | 2 pcs | 2 pcs |
Heating Method | Chamber Heating | Chamber Heating |
Inner Dimensions (WxDxH, mm) | 400×400×400 | 450×450×450 |
Outer Dimensions (WxDxH, mm) | 600×570×1390 | 610×590×1350 |
Power Input | 3000 W | 3500 W |
Power Supply | AC220V 50Hz | AC220V 50Hz |
Temp. Range | RT+10 °C ~ 200 °C |